News articles for MOSIS; CMP; CMC:
Tuesday, June 22, 2010
MOSIS, CMP and CMC Partner to Introduce a 3D-IC Process
MARINA DEL REY, CA -- (Marketwire) -- 06/22/10 -- MOSIS, CMP and CMC are partnering to offer a 3D-IC Multi-Project Wafer (MPW) service based on Tezzaron Semiconductor's SuperContact technology and GLOBALFOUNDRIES' 130nm CMOS process.
The first MPW run is targeting January 2011:
2-tier face-to-face bonded wafers
130nm CMOS process for ...
read more